LEAD OPTIMA ELEMENT TECH (HUITA MATERIALS)

Contact Us

Tel: +86-18 423 717 818
E-mail: sales@cqoptics.com
Add: No. 5, Torch Ave, Jiulongpo District, Chongqing,400080 China 3rd Zone, Gongdatang, Jiangdong Street, Yiwu City, Zhejiang Province 322099 CHN
Skype: 27393442@qq.com
WeChat: Matrip023
whatsapp: +86 18423717818
Skype: 27393442@qq.com facebook: https://twitter.com/@loptimaH9926 sales@cqoptics.com

Products > Sputtering Targets > Ceramic Targets > ITO (Low density) Sputtering Target
ITO (Low density) Sputtering Target
Product name : ITO (Low density) Sputtering Target
Product No. : 202199141323
Material : In2O3+SnO2
Size : 10*3; 18*8; 24*14; 30*10mm or according to the customer's requirements
Density(g/cm3) : Relative density: 60±2%
Refractive Index : Resistivity ≤1.6X10-4 Ω·cm
Form : Green Tablets
Purity : 4N
Application : ITO conductive film, LCD, LED, etc
←[Previous Product]              [Next Product]→
Online Inquiry         Email Us

  Details:
Production process of ITO target
1. Hot isostatic pressing method
2. Hot pressing method
3. Sintering method
 
Grain size: 5 ~ 15 µ M
Resistivity: 1.2 × 10-4Ω·cm
Linear expansion coefficient: 5.8 × 10-6K-1

  Related Products :

Silicon Carbide Target
Silicon Carbide Target

ZnS tablet sintering
ZnS tablet sintering

Boron Carbide Target
Boron Carbide Target

TiOx Target
TiOx Target

α-Al203 tablets
α-Al203 tablets

ITO Rotating Sputtering Target
ITO Rotating Sputtering Target

ITO (High density) Sputtering Target
ITO (High density) Sputtering Target

Silicon Rotary Sputtering Target
Silicon Rotary Sputtering Target

Online service

Skype: 27393442@qq.com sales@cqoptics.com